Industrial microdeposition system including masking to reduce the impact of droplet alignment and droplet volume tolerances and errors

ABSTRACT

A microdeposition system microdeposit droplets of fluid material to define a feature pattern on a substrate. The feature pattern for the substrate is defined. A mask is created for the feature pattern that reduces a density of defects that occur due to a malfunctioning nozzle of the microdeposition head. The droplets of fluid material are microdeposited onto the substrate based on the mask to define subfeatures of the feature pattern. One of the nozzles of the microdeposition head is assigned to each of the sub-features in the feature pattern. The nozzles may be assigned randomly or using other functions. The assigned nozzles in the mask are assigned to one of a plurality of passes of the microdeposition head.

FIELD OF THE INVENTION

The present invention relates to microdeposition systems, and moreparticularly to a mask generator for microdeposition systems used tofabricate printed circuit boards, polymer light emitting diode (PLED)displays, and other electronic devices requiring microdeposition offluid materials.

BACKGROUND OF THE INVENTION

Manufacturers have developed various techniques for fabricatingmicrostructures that have small feature sizes on substrates. Typicallythe microstructures form one of more layers of an electronic circuit.Examples of these structures include polymer light-emitting diode (PLED)display devices, liquid crystal display (LCD) devices, printed circuitboards and the like. Most of these manufacturing techniques arerelatively expensive to implement and require high production quantitiesto amortize the cost of the fabrication equipment.

Techniques for forming microstructures on a substrate include screenprinting. During screen printing, a fine mesh screen is positioned onthe substrate. Fluid material is microdeposited through the screen andonto the substrate in a pattern defined by the screen. Screen printingrequires contact between the screen and the substrate. Contact alsooccurs between the screen and the fluid material, which contaminatesboth the substrate and the fluid material.

Photolithography is another manufacturing technique that is used tomanufacture microstructures on substrates. Photolithography is also notcompatible with the fabrication of some devices. Manufacturing processesusing photolithography generally involve the deposition of a photoresistmaterial onto a substrate. The photoresist material is cured by exposureto light. A patterned mask is used to selectively apply light to thephoto resist material. Photoresist that is exposed to the light is curedand unexposed portions are not cured. The uncured portions are removedfrom the substrate. An underlying surface of the substrate is exposedthrough the removed photoresist layer. The cured portions of the photoresist layer remain on the substrate. Another material is thenmicrodeposited onto the substrate through the opened pattern on thephotoresist layer, followed by the removal of the cured portion of thephotoresist layer.

Photolithography has been used successfully to manufacture manymicrostructures such as traces on circuit boards. However,photolithography contaminates the substrate and the material formed onthe substrate. The cost of the photolithography process can beprohibitive when relatively small quantities are to be fabricated.

Spin coating has also been used to form microstructures. Spin coatinginvolves rotating a substrate while depositing fluid material at thecenter of the substrate. The rotational motion of the substrate causesthe fluid material to spread uniformly across the surface of thesubstrate. Spin coating is also an expensive process because a majorityof the fluid material does not remain on the substrate. Additionalmaterial is wasted due to the requirement that the entire surface of thesubstrate must be coated with a uniform layer. While laser ablation canbe used to remove material, laser ablation requires expensive equipment.Laser ablation may also create ash, which contaminates the substrate. Inaddition, the size of the substrate is limited by the spin coatingprocess to less than approximately 12″, which makes spin coatingunsuitable for larger devices such as PLED televisions.

SUMMARY OF THE INVENTION

A microdeposition system and method according to the present inventionmicrodeposits droplets of fluid material to form a feature pattern on asubstrate. The feature pattern for the substrate is initially defined. Amask is created for the feature pattern that reduces a density ofdefects that occur due to tolerance variations and/or a malfunctioningnozzle of the microdeposition head. The droplets of fluid material aremicrodeposited onto the substrate based on the mask to definesub-features of the feature pattern.

In other features, one of the nozzles of the microdeposition head isassigned to each of the sub-features in the feature pattern. The step ofassigning nozzles may include randomizing an assigned nozzle for thesub-features. The assigned nozzles in the mask are also assigned to oneof a plurality of passes of the microdeposition head.

In still other features, the microdeposition pass is performed by atleast one of moving the microdeposition head in a linear directionrelative to the substrate and moving the substrate in a linear directionrelative to the microdeposition head.

In other features, at least one of the sub-features is formed bymultiple droplets that are microdeposited in layers. The mask assigns adifferent nozzle to each of the layers of the multiple-layersub-feature.

In yet other features, the feature pattern may define a component of anelectrical device. The electrical device may be one of a polymer lightemitting diode, a light panel, an integrated circuit package and aprinted circuit board. The droplets may form at least one of a lightemitter, an electrical conductor, an electrical trace, an insulator,solder bumps, bondwire, plating, interconnects, a capacitor and aresistor.

In yet other features, the mask increases a number of microdepositionpasses required to microdeposit the feature pattern and reduces repeatedfiring of nozzles of the microdeposition head during each of themicrodeposition passes.

Further areas of applicability of the present invention will becomeapparent from the detailed description provided hereinafter. It shouldbe understood that the detailed description and specific examples, whileindicating the preferred embodiment of the invention, are intended forpurposes of illustration only and are not intended to limit the scope ofthe invention.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will become more fully understood from thedetailed description and the accompanying drawings, wherein:

FIG. 1 is a functional block diagram of an exemplary microdepositionsystem according to the present invention;

FIG. 2 is a functional block diagram of a controller including a maskgenerating module for the microdeposition system of FIG. 1;

FIG. 3 illustrates a waveform generator that is capable of generatingdifferent firing waveforms for each nozzle;

FIG. 4 illustrates rise slope, duration, timing and fall slope of anexemplary nozzle firing waveform;

FIGS. 5A and 5B illustrates pitch adjustment of the microde positionhead;

FIG. 6 illustrates an exemplary feature pattern to be microdepositedonto a substrate including sub-features that are defined by droplets offluid material;

FIG. 7 illustrates a portion of the feature pattern in FIG. 6;

FIG. 8 illustrates microdeposition of sub-features of the portion on thesubstrate in a single pass using microdeposition without masking;

FIG. 9 illustrates microdeposition of sub-features on the substrate withan exemplary mask to reduce the impact of defects due to nozzlemisalignment and/or improper drop formation of one or more nozzles;

FIGS. 10-22 illustrate successive passes for depositing additionalsub-features of the exemplary mask in FIG. 9;

FIG. 23 illustrates a feature pattern including sub-features defined bymultiple droplet layers;

FIG. 24 illustrates deposition of a multiple layer sub-feature in thefeature pattern of FIG. 23 using the same nozzle to microdeposit all ofthe layers;

FIG. 25 illustrates deposition of the multiple layer sub-feature in thefeature pattern of FIG. 23 by varying nozzles used to microdeposit thedifferent layers;

FIG. 26 illustrates an exemplary polymer light-emitting diode (PLED)display device;

FIG. 27 illustrates microdeposition of red, green and blue componentsforming a pixel using a first method; and

FIG. 28 illustrates microdeposition of red, green and blue pixelcomponents forming pixels using the masking method according to thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The following description of the preferred embodiment(s) is merelyexemplary in nature and is in no way intended to limit the invention,its application, or uses. For purposes of clarity, the same referencenumbers will be used in the drawings to identify similar elements.

Microdeposition of fluid materials onto a substrate is disclosed indetail in commonly assigned Applications entitled “InterchangeableMicrodeposition Head Apparatus and Method”, Ser. No. ______, filed______, “Apparatus and Method for Piezo Microdeposition of FluidMaterials”, Ser. No. ______, filed ______, “Waveform Generator forMicrodeposition Control System”, Ser. No. ______, filed ______, and“Over-Clocking in a Microdeposition Control System to ImproveResolution”, Ser. No. ______, filed ______, and “IndustrialMicrodeposition System for Polymer Light Emitting Diode Displays,Printed Circuit Boards and The Like”, Ser. No. ______, filed ______,which are hereby incorporated by reference.

These applications disclose the deposition of fluid materials onto asubstrate using a microdeposition head including a plurality of nozzles.Various ways of aligning the nozzles and/or adjusting the shape of theresulting droplets that are fired from the microdeposition head aredisclosed. While these methods improve the uniformity and alignment ofdroplets that are discharged onto the substrate, minor variations indroplet size and alignment may still occur.

Briefly, the present invention generates a mask that alters arelationship between nozzles of the microdeposition head that areassigned to microdeposit sub-features in the feature pattern to reduce(or de-localize) the impact of nozzles that are both functioning andmalfunctioning. As used herein, the term malfunctioning refers tonozzles that are misaligned outside of a desired tolerance orspecification and/or have droplet formation/volume that is outside of adesired specification. The term functioning shall refer to nozzles thatare within the desired tolerance or specification and have dropletformation/volume that is within the desired specification.

For example, functioning nozzles may have a tolerance of ±5% foralignment and/or drop volume. These tolerances can correspond to adifference of 10% between adjacent nozzles, which may cause problems forsome devices formed by microdeposition. Further, the difference betweena malfunctioning nozzle and a functioning nozzle can exceed 10%, whichalso may cause problems for some devices formed by microdeposition.

The foregoing discussion will initially describe an exemplarymicrodeposition system followed by a discussion of methods according tothe present invention for delocalizing the impact of the droplet sizeand/or alignment variations that may occur for both functioning andmalfunctioning nozzles.

FIGS. 1-5 illustrate an exemplary microdeposition system 20. Referringnow to FIG. 1, a microdeposition system 20 is illustrated and includes acontroller 22, a head assembly 24, and a substrate assembly 26. Arotational position or pitch of the head assembly 24 is adjusted usingan optional rotary position motor 30 and an optional rotary positionsensor 32. Manual adjustment can also be performed. Likewise, a heightof the head assembly 24 relative to the substrate assembly 26 may beadjusted using a height adjustment motor 34 and a height sensor 36. Alateral position of the head assembly 24 is adjusted using a lateralposition motor 40 and a lateral position sensor 42. Manual height andlateral position may be performed to reduce cost.

A microdeposition head 50 with a plurality of nozzles is mounted on thehead assembly 24. A first camera 52 is optionally mounted on the headassembly 24. The first camera 52 is used to position the head assembly24 relative to a substrate 53 that is located on the substrate assembly26. More particularly, the first camera 52 is used to align themicrodeposition head 50 using one or more nozzles of the head 50 as areference. In addition, the first camera 52 is used to perform dropanalysis on the substrate.

A laser 60 can optionally be used for laser ablation of applied fluidmaterial to reduce minimum feature sizes and/or for creating vias. Whilethe laser 60 is mounted on the head assembly 24 in FIG. 1, the laser 60can be mounted on a laser assembly (not shown) that moves independentlyfrom the head assembly 24. A fluid supply 62 is connected by one or moreconduits 64 to the microdeposition head 50. The fluid supply 62 providesone or more types of fluid materials, such as polymer PPV for red, greenand blue pixels, solvent, resistive fluid materials, conductive fluidmaterials, resist fluid materials, and/or insulating fluid materials.The fluid supply 62 is optionally capable of changing the fluid materialthat is supplied by using a solvent flush before switching to a newfluid material.

A lateral position motor 64 and a lateral position sensor 66 are used toposition the substrate assembly 26 with respect to the head assembly 24.In a preferred embodiment, the lateral position motor 40 moves along afirst axis. The lateral position motor 64 moves along a second axis thatis perpendicular to the first axis. As can be appreciated by skilledartisans, the position motors 30, 34, 40 and 64 are associated witheither the head assembly 24 or the substrate assembly 26. In otherwords, the degrees of relative movement and rotation may be provided bymoving or rotating the substrate assembly 26 and/or the head assembly 24and any combination thereof.

A blotting station 70 and a blotting media motor 72 are preferablylocated adjacent to the substrate assembly 26. To prevent clogging ofnozzles of the microdeposition head 50, the microdeposition head 50 iscleaned periodically during use. The microdeposition head 50 is movedinto position over the blotting station 70 and a nozzle plate (notshown) of the microdeposition head is wiped on the blotting station 70.The blotting station 70 includes a roll of blotting material. A blottingmotor 72 advances the roll of blotting material to provide a cleansurface for blotting of the nozzle plate of the microdeposition head 50.

A capping station 80 is also located adjacent to the head assembly 24.The microdeposition head 50 is parked in the capping station 80 when themicrodeposition system 20 is not in use. The capping station 80 includesa cup containing wet fluid material and/or solvent. The capping station80 is used to prevent the fluid material that is delivered by themicrodeposition head 50 from clogging the nozzles of the microdepositionhead 50. A second camera 84 is used for droplet analysis and is locatedadjacent to the capping station 80. Preferably, the first and secondcameras 52 and 84 and the controller 22 provide digital opticalrecognition. A strobe 85 may be provided to capture the droplets.

The substrate assembly 26 includes a chuck 86, which engages andpositions the substrate 53. The substrate assembly 26 includes anoptional curing device such as a temperature controller 90 and/or anoptional ultraviolet (UV) source 92. The temperature controller 90controls the temperature of the chuck 86. A temperature of approximately50° C. is typically suitable to reduce drying times for substrateshaving thicknesses between 0.3 and 1.2 mm. The chuck 86 preferablyincludes a vacuum circuit that positions and engages the substrate 53.Alternately, the chuck 86 may include other types of devices thatposition and engage the substrate 53 during microdeposition. Forexample, fluid surface tension, magnetism, physical engagement of thesubstrate or any other approach may be used to engage the substrate 53during microdeposition. Additional details concerning the chuck arefound in “Temperature Controlled Vacuum Chuck”, Ser. No. ______, filed______, which is hereby incorporated by reference.

Skilled artisans will appreciate that manual adjustment devices such asa hand adjustment (for example, a knob that turns a worm gear or anyother mechanical adjustment) can be used to replace one or more of themotors 30, 34, 40, and 64 to reduce cost. Visual devices such as a scalecan be used to replace one or 35 more of the sensors 32, 36, 42, and 66to reduce cost. In addition, the function of the motors 30, 34 and/or 40may be combined in a multi-axis motor if desired. In one embodiment, oneor more of the positioning devices are implemented using an air bearingand a linear motor. Still other variations will be apparent to skilledartisans. The functionality that is provided by the motors and sensorsis similar to a computer numerical controlled (CNC) milling machine.Preferably, the motors provide adjustment in three or more axes.Additional ranges of motion can be provided for three-dimensional (3D)microdeposition or microdeposition of complex curved shapes.

The microdeposition head 50 is preferably positioned over the substrateat a distance of between approximately 0.5 mm and 2.0 mm. In a highlypreferred embodiment, the microdeposition head is positioned a distancethat is at least 5 times the size of the droplet of the fluid material,although other heights may be used. When smaller pitch sizes arerequired, the microdeposition head 50 is rotated to reduce the pitch.When larger pitches are required, the microdeposition head 50 is rotatedand some of the nozzles are not used, for example every other nozzle isnot used.

As can be appreciated, the microdeposition system 20 shown in FIG. 1includes one or more optional systems. For example, optional systemsinclude, but are not limited to, laser ablation, automated height andpitch positioning systems, optical imaging, chuck temperature control,and/or UV curing. For example when microdepositing the same product in ahigh volume production application, mechanical alignment techniques canbe used. The pitch of the microdeposition head can be mechanicallyadjusted to a desired pitch.

Referring now to FIG. 2, the controller 22 is illustrated in furtherdetail. The controller 22 includes one or more processors 100, memory102 (such as random access memory (RAM), read-only memory (ROM), flashmemory, and/or any other suitable electronic storage medium), and aninput/output interface 104. As can be appreciated, while a singlecontroller 22 is shown, multiple controllers may be used. A dropanalysis module 110 optionally performs drop analysis using the firstcamera 52 and/or second camera 84, as will be described more fullybelow.

An optional alignment module 112 aligns the substrate and the head 50using optical character recognition (before depositing the fluidmaterial) using the first camera 52 and/or the second camera 84. Manualalignment can also be performed. A nozzle position and firing module 114adjusts the position of the head assembly 24 with respect to thesubstrate 53 and generates nozzle firing waveforms to create features onthe substrate. A waveform generating module 116 operates in conjunctionwith the nozzle position and firing module 114 and adjusts the timing,rise slope, fall slope, and/or amplitude of nozzle firing waveforms, aswill be described more fully below. The waveform generating module 116also optionally adjusts nozzle firing timing for changes in the pitch ofthe head.

A mask generating module 118 generates a mask that assigns sub-featuresof the feature pattern to the nozzles of the microdeposition head 50 foreach pass. As used herein, the term mask refers to a digital file,relationship and/or algorithm between sub-features of the featurepattern and the nozzle that is assigned (rather than a physical masksuch as those used in photolithography). The mask generating module 118reduces the number of sub-features microdepositioned by a single nozzleduring a microdeposition pass. In one exemplary embodiment, the maskgenerating module 118 randomizes or otherwise changes a relationshipbetween the assigned nozzle and the sub-feature in the feature pattern.

The substrate 53 may includes a plurality of marks that are used by thefirst camera 52 and/or the second camera 84 to align the substrate 53and the head 50 before depositing the fluid material(s). Rough initialor final positioning may be performed manually if desired. Alternately,the alignment module 112 may use optical character recognition toperform rough and/or fine alignment using the marks.

An exemplary microdeposition head 50 is a shear mode piezo transducer(PZT) microdeposition head. When the nozzle firing waveforms aretriggered by the controller 22, shear mode actuation causes the dropletto be dispensed. Skilled artisans will appreciate that other types ofmicrodeposition heads are contemplated such as thermal or bubblemicrodeposition heads, continuous drop microdeposition heads, PZTvalves, and microelectromechanical valves. The head assembly 24 may alsoinclude multiple microdeposition heads 50.

Typically, the microdeposition head 50 will include between 64 and 256nozzles, although additional or fewer nozzles may be utilized. Eachnozzle of the microdeposition head 50 is capable of dispensing between5000-20,000 drops per second, although higher or lower drop dispensingrates may be provided. Typically, each droplet contains between 10 and80 picoliters of fluid material depending upon the type ofmicrodeposition device that is used, although increased or decreaseddroplet volume may be provided.

Exemplary devices that can be fabricated using the microdepositionsystem 20 include monochrome and color PLEDs, printed circuit boards(PCBs), and other structures. A resist replacement such as an acrylicpolymer can be microdeposited to eliminate the mask and exposure processin photolithography. A metallic ink or another metallic conducting fluidcan be microdeposited to replace traces. Fluids having resistiveproperties such as resistive inks can be used to create resistors andcapacitors. The microdeposition system may also be used to microdepositlegends, solder mask, solder paste and other fluid materials that areused in printed circuit board manufacturing. Laser trimming of themicrodeposited droplets is optionally employed to improve accuracy witha corresponding increase in cost. Microdeposition can be used tofabricate a pixel plate of a light panel. The fuses and traces can bemicrodeposited. Microdeposition can also be used to microdeposit solderbumps, bondwire, and other structures on integrated circuit packages.Still other applications will be apparent to skilled artisans.

Curing devices may be provided with the substrate assembly 26 to controlcuring and shrinkage. The temperature controller 90 and/or ultraviolet(UV) source 92 are provided to facilitate proper curing of the fluidmaterial that is microdeposited in the wells. For example, thetemperature controller 90 heats the chuck 86, which warms the substrate53 through contact. Alternately, the UV source 92 generates ultravioletlight that is directed at the fluid material that is microdeposited onthe substrate 53 to facilitate curing. Additionally, airflow in avicinity surrounding the substrate assembly may be controlled(prevented) using an enclosure, a fan, or other suitable airflowequipment. Equipment that is typically used in a clean room may beemployed.

Referring now to FIGS. 3 and 4, nozzle firing waveforms for each of thenozzles 134-1, 134-2, 134-3, . . . , and 134-n are individuallycontrolled by the controller 22. By controlling the nozzle firingwaveforms individually, the uniformity of droplets is significantlyimproved. In other words, if the droplets from a particular nozzle havea non-uniform or undesirable shape, the nozzle firing waveform for thecorresponding nozzle is adjusted to provide a droplet with a uniform ordesired shape. The waveform generating module 116, the drop analysismodule 110 and/or the position and firing modules 114 collect data usingthe first and/or second cameras 52 and 84 and optical recognition.Adjustments may be made automatically using software and feedback fromdroplet analysis.

More particularly, the waveform generating module 116 communicates withwaveform generators 136-1, 136-2, 136-3, . . . , and 136-n toindividually adjust timing, duration, amplitude, rise slope and/or fallslopes of the nozzle firing waveforms for each of the nozzles 134. InFIG. 4, an exemplary nozzle firing waveform 140-1 is shown. Theexemplary nozzle firing waveform 140-1 has a duration timing t_(D)141-1, a rise slope 142-1, a fall slope 144-1 and amplitude 146-1. Eachof these parameters can be adjusted by the waveform generators 136 tovary the characteristics of the nozzle firing waveform.

Over-clocking may also be used to improve feature resolution.Over-clocking is used to provide improved resolution and to optionallyadjust for changes in the pitch of the head 50. As used herein,over-clocking refers to an increased clock frequency relative to adroplet width and a lateral and vertical speed of the microdepositionhead. In microdeposition applications such as ink jets, a print grid isdefined that includes grid lines that occur at a clock rate. The clockrate and lateral and vertical head speed are synchronized to provide (ornot provide) one droplet in each rectangle (or square) of the grid. Inother words, the droplet to grid rectangle ratio is 1:1. Some minoroverlapping of droplets may occur in ink jets. Either a droplet isproduced or is not produced in each rectangle or square of the grid.Over-clocking involves using a clock rate that is substantially higher.The clock rate is increased at least 3 times the conventional 1:1 ratio.In a highly preferred embodiment, the clock rate is increased 10× ormore.

Referring now to FIGS. 5A and 5B, the microdeposition head 50 includes aplurality of nozzles 134 that are preferably spaced uniformly. However,non-uniform spacing can also be used. The angular orientation of themicrodeposition head 50 is adjusted relative to a plane defined bylateral movement of the head assembly and/or the substrate. When themicrodeposition head 50 has a generally perpendicular orientationrelative to the movement of the substrate 53 (shown by arrow 156), thepitch is at a maximum value as is illustrated at 150. Likewise, an areathat is swept by the head 50 is also at a maximum value as indicated at152. As the angle of the head 50 is decreased from the perpendicularorientation, the pitch decreases as indicated at 160. Likewise, the areathat is swept by the head 50 also decreases as indicated at 162.

Referring now to FIGS. 6-8, an exemplary feature pattern 200 is shown.While the feature pattern 200 includes non-overlapping droplets formingindividual sub-features 201, the droplets or sub-features 201 can beoverlapping. Spacing between the individual sub-features 201 can beadjusted to be smaller or larger. In the example in FIG. 6, the featurepattern 200 is microdeposited in 3 passes identified at 202-1, 202-2 and202-3. Each nozzle 134-1, 134-2, . . . and 134-n deposits a row ofsub-features 201. The position of the microdeposition head 50 during thepass 202-1 and 202-2 is offset by the width of the microdeposition head50 in the pass 202-2 and 202-3, respectively.

More generally, the feature pattern 200 can be microdeposited in aminimum of n passes. The number of passes n is determined by arounded-up integer value of a length of the feature pattern (in adirection perpendicular to the direction of passes) divided by the widthof the microdeposition head 50. The microdeposition head 50 is locatedin n different pass positions that are spaced approximately the width ofthe microdeposition head 50. The same nozzle is used to microdeposit allof the sub-features in the same row.

Using the mask, the number of passes will increase. The sub-features ofthe feature pattern 200 are microdeposited according to the presentinvention in (n+m) passes. The microdeposition head 50 is moved to passpositions that are spaced less than the width of the microdepositionhead 50. The same nozzle is not used to microdeposit all of thesub-features 201 in the same row.

A portion 204 of the feature pattern 200 is shown in FIG. 7. Using themicrodeposition head 50, the first nozzle 134-1 can microdepositsub-features in columns 208-1, 2084, 208-6, and 208-7 in a first row206-1 of the feature pattern 204 by firing the droplets of fluid at theappropriate time. Likewise, second, third, and nth rows 206-2, 206-3, .. . and 206-n, respectively can be microdeposited in a similar mannerduring the same pass.

While the pitch of the microdeposition head 50 is shown to beapproximately perpendicular to a direction of movement of themicrodeposition head, other pitch angles can be used as described above.Additionally, the head assembly may include multiple microdepositionheads. The relative position of the multiple heads can be adjusted usingmicroactuators or fixed in production. As can be appreciated, thefeature pattern in the direction of the pass can be any length.

During operation and/or between diagnostics, misalignment of one or morenozzles may occur and/or droplet formation may change. In addition, thetolerances of operating nozzles may be unacceptable. For example, thenozzle 134-2 may be misaligned and/or have non-ideal droplet formation.Alternately, the tolerance of nozzle 134-3 and 134-4 may cause adifference of 10% as described in the example set forth above. By usingthe same nozzle to form the sub-features in a specific area such as allof the sub-features 201 in a row in the pass direction, the effects ofthe misaligned nozzle 134-2 (or nozzle having non-ideal dropletformation) or the tolerance of functioning nozzles may cause substantialproblems in the finished device. By using the mask, the localized errorrate or variations are reduced, which increases yields.

The mask generator 118 according to the present invention provides amask that assigns individual sub-features in the feature pattern to aparticular pass of the microdeposition head 50 and to a particularnozzle of the microdeposition head. The mask generator 118 varies theuse of the nozzles to reduce the impact of a misaligned nozzle and/ornozzles that generate non-ideal droplets. By reducing the potential forlocalized defects, the yield of the microdeposition process can beimproved. The mask generator 118 may use a randomizing function or othersuitable methods for altering the relationship between the nozzleassigned to the features of the feature pattern.

Referring now to FIGS. 9-22, an exemplary mask for the portion 204 isshown. In FIG. 9, the complete mask is shown. Multiple passes (generallyidentified at 210) of the microdeposition head will be required to coverthe same area. The microdeposition head 50 is moved relative to thesubstrate (as shown generally at 214) to allow the assigned nozzle tomicrodeposit the droplet in accordance with the mask generated by themask generator 118.

In a first pass shown in FIG. 10, the first nozzle 134-1 of themicrodeposition head 50 is aligned with the second row 206-2. The firstnozzle 134-1 microdeposits a droplet in a second column 208-2 of thesecond row 206-2 to form a sub-feature. A second nozzle 134-2microdeposits a droplet in a third column 208-3 of the third row 206-3.A fourth nozzle 134-4 microdeposits a droplet in a sixth column 208-6 ofa fifth row 206-5. As can be appreciated, the number of dropletsmicrodeposited in each row can be varied.

Referring now to FIG. 11, a second pass is performed by positioning themicrodeposition head 50 with the first nozzle 134-1 adjacent to thefourth row 206-4. The first, third, fourth and fifth nozzles 134-1,134-3, 134-4 and 134-5, respectively, microdeposit droplets in theseventh, eighth, seventh, and fourth columns 208-7, 208-8, 208-7, and208-4, respectively.

Referring now to FIG. 12, a third pass is performed by positioning themicrodeposition head 50 with the first nozzle 134-1 adjacent to thesixth row 206-6. The first, second and third nozzles 134-1, 134-2, and134-3, respectively, microdeposit droplets in the fourth, sixth andninth columns 208-4, 208-6, 208-9, respectively.

Referring now to FIG. 13, a fourth pass is performed by positioning themicrodeposition head 50 with the first nozzle 134-1 adjacent to theeighth row 206-8. The first nozzle 134-1 microdeposits a droplet in theseventh column 208-7, respectively.

Referring now to FIG. 14, a fifth pass is performed by positioning themicrodeposition head 50 with the second nozzle 134-2 adjacent to thefirst row 206-1. The second, third, fourth, fifth and sixth nozzles134-2, 134-3, 1344, 134-5, and 134-6, respectively, microdepositdroplets in the seventh, fourth, second, second, and third columns208-7, 208-4, 208-2, 208-2, and 208-3, respectively.

Referring now to FIG. 15, a sixth pass is performed by positioning themicrodeposition head 50 with the second nozzle 134-2 adjacent to theeighth row 206-8. The second nozzle 134-2 microdeposits a droplet in thefirst column 208-1.

Referring now to FIG. 16, a seventh pass is performed by positioning themicrodeposition head 50 with the third nozzle 134-3 adjacent to thefirst row 206-1. The third and fourth nozzles 134-3 and 134-4microdeposit droplets in the first and fifth columns 208-1 and 208-5.

Referring now to FIG. 17, an eighth pass is performed by positioning themicrodeposition head 50 with the fifth nozzle 134-5 adjacent to thefirst row 206-1. The fifth, sixth, seventh and eighth nozzles 134-5,134-6, 134-7 and 134-8, respectively, microdeposit droplets in thefourth, seventh, ninth, and fourth columns 208-4, 208-9, 208-7 and208-4, respectively.

Referring now to FIG. 18, a ninth pass is performed by positioning themicrodeposition head 50 with the sixth nozzle 134-6 adjacent to thefirst row 206-2. The sixth, seventh and eighth nozzles 134-6, 134-7, and134-8, respectively, microdeposit droplets in the sixth, third andeighth columns 208-6, 208-3, and 208-8, respectively.

Referring now to FIG. 19, a tenth pass is performed by positioning themicrodeposition head 50 with the sixth nozzle 134-6 adjacent to thethird row 206-3. The sixth and seventh nozzles 134-6 and 134-7,respectively, microdeposit droplets in the fifth and sixth columns 208-5and 208-6, respectively.

Referring now to FIG. 20, a eleventh pass is performed by positioningthe microdeposition head 50 with the seventh nozzle 134-7 adjacent tothe seventh row 206-7. The seventh nozzle 134-7 microdeposits a dropletin the fourth column 2084.

Referring now to FIG. 21, a twelfth pass is performed by positioning themicrodeposition head 50 with the eighth nozzle 134-8 adjacent to thesecond row 206-2. The eighth nozzle 134-8 microdeposits a droplet in thefirst column 208-1.

Referring now to FIG. 22, a thirteenth pass is performed by positioningthe microdeposition head 50 with the eighth nozzle 134-8 adjacent to thesixth row 206-6. The eighth nozzle 134-8 microdeposits a droplet in thesecond column 208-2.

As can be appreciated, when nozzles 134 of the microdeposition head arenot aligned with a row of the portion 204 during a pass, the non-alignednozzles can be used to microdeposit droplets in rows above or below theportion 204. For example, referring back to FIG. 11, the nozzles 134-6,134-7 and 134-8 can be used to microdeposit droplets in rows of thefeature pattern 200 that are one, two and three rows, respectively,below the row 206-8. Likewise, additional columns before and/or afterthe column 208-9 can be microdeposited during the passes described inFIGS. 10-22.

Other functions can be used by the mask generator 118 to generate themask. For example, the function need not be random. Referring now toFIG. 8, if three passes are desired, one third of the sub-features canbe microdeposited with the microdeposition head 50 located as shown. Themicrodeposition head can be moved to a second position and a secondthird of the sub-features can be microdepositioned. Finally, a finalthird of the sub-features can be microdeposited with the microdepositionhead 50 in a third position.

In other words, any function that does not involve microdepositioningall of the sub-features in a row using the same nozzle during amicrodeposition pass can be used. Additional mask functions aredisclosed in “System and Method for Color Image Reproduction From ColorSeparations Prepared from Random Fixed Size Dot Placement” U.S. Pat. No.5,175,804 to Wittmann, Issued Dec. 29, 1992, which is herebyincorporated by reference in its entirety.

Referring now to FIG. 23, a portion of a feature pattern 230 may includeseveral layers that are microdeposited during multiple passes. Forexample, a sub-feature 234 includes first, second and third droplets238-1, 238-2 and 238-3 that are microdeposited using the same nozzleduring first, second and third passes, 240-1, 240-2 and 240-3,respectively.

Referring now to FIG. 24, sub-features of each layer can bemicrodeposited in three passes in a manner similar to FIG. 9. However,the sub-feature 234 may have a specified thickness or other designparameter. If the nozzle that is used to define the sub-feature 234 isnot depositing a uniform or predetermined droplet volume and/or shapeand/or the droplet is not aligned correctly or the tolerances ofadjacent functioning nozzles are unacceptable, the sub-feature may notmeet the design parameter. If the defects caused by the errant nozzle ortolerances can be confined to a single droplet in one layer or pass,there is a much higher probability that the sub-feature will meet thedesign parameter.

Accordingly, the mask generator 118 according to the present inventionuses a different nozzle for depositing subsequent layers. For example, afirst layer 248-1 of the feature 234 is microdeposited by the sixthnozzle 134-6 during one pass. A second layer 248-2 is defined by thefifth nozzle 134-5 during another pass. A third layer 248-3 is definedby the third nozzle 134-3 during another pass. As can be appreciated,each of the layers 250-1, 250-2, and 250-3 can be microdeposited duringone or more passes.

As can be appreciated by skilled artisans, the number of passes will bedetermined by design criteria and the tolerance of the nozzles.Increasing the number of passes tends to increase the microdepositionspeed or the amount of time required to microdeposit the featurepattern. Increasing the number of passes also tends to increase theaccuracy or quality of the feature pattern by reducing the impact oftolerance variations of functioning and/or malfunctioning nozzles.

Referring now to FIG. 26, an exemplary polymer light-emitting diode(PLED) display device 300. The PLED device 300 include a glass plate 304that is held by a vacuum chuck 306 or any other suitable device duringmicrodeposition. The PLED device 300 further includes an ITO anode 308,a hole transport layer (typically PEDOT or PANI) (not shown), a polymeremissive material 310 and resist 312. Microdeposition heads 313 are usedto microdeposit a repeating pattern of red 314, green 316 and blue 318components of PLED pixels.

Referring now to FIG. 27, one pattern for microdepositing red 314, green316 and blue 318 components of PLED pixels 320 is shown. The red 314,green 316 and blue 318 pixel components of each pixel are microdepositedby the red, green and blue microdeposition heads, respectively. Each ofthe pixel components includes multiple adjacent and/or overlappingdroplets. The droplets of each pixel component are preferablymicrodeposited using the same nozzle to allow all of the droplets forthe pixel component to be microdeposited while the droplets of the pixelcomponent are still wet.

For example, the red microdeposition head microdeposits the redcomponents 314 labeled “1”, “2”, “3” and “4” in FIG. 27 in one passusing four nozzles. The red microdeposition head is repositioned andthen the red microdeposition head microdeposits the red components 324labeled “1”, “2”, “3” and “4” in FIG. 27 in a second pass. The greenmicrodeposition head microdeposits the green components 316 and 326labeled “1”, “2”, “3” and “4” in first and second passes, respectively.The blue microdeposition head likewise microdeposits the blue components316 and 326 labeled “1”, “2”, “3” and “4” in first and second passes,respectively.

For example, if the second nozzle on the green microdeposition head isnot depositing a sufficient amount of polymer emissive material (eitheron low side within tolerance or outside of tolerance), the resultingPLED display may have a line defect that will noticeable to the nakedeye. The same problem may occur if adjacent nozzles are at opposite endsof (and within) the tolerance for alignment and/or droplet volume or ifthe nozzles are outside of the tolerances for droplet alignment orvolume, as described above.

Referring now to FIG. 28, another pattern for microdepositing red 314,green 316 and blue 318 pixel components of PLED pixels 320 is shown. Thered 314, green 316 and blue 318 pixel components of each pixel aremicrodeposited by the red, green and blue microdeposition heads,respectively. The mask is used to vary the nozzle that is used tomicrodeposit pixel components of adjacent pixels having the same colorpolymer emissive material in the display row or column as was discussedin detail above. For example, instead of taking two passes as in FIG.27, the PLED takes eight passes.

For example, if the second nozzle on the green microdeposition head isnot depositing a sufficient amount of polymer emissive material, theresulting PLED display will not have a line defect that will benoticeable to the naked eye if the mask is used. If adjacent nozzles areat opposite ends of (and within) the tolerance for alignment and/orvolume or if the nozzles are outside of the tolerances for alignment orvolume, as described above, the masking process reduces the adverseimpact of the nozzle.

While a simple offset-row offset pattern is shown in FIG. 28, morecomplex random or non-random masks that are described above can be used.In addition, while a color PLED is shown in FIGS. 26-28, monochromePLEDs can also be microdeposited using similar techniques.

Those skilled in the art can now appreciate from the foregoingdescription that the broad teachings of the present invention can beimplemented in a variety of forms. Therefore, while this invention hasbeen described in connection with particular examples thereof, the truescope of the invention should not be so limited since othermodifications will become apparent to the skilled practitioner upon astudy of the drawings, the specification and the following claims.

1. A method for microdepositing droplets of fluid material using amicrodeposition system to define a feature pattern on a substrate,comprising: defining said feature pattern for said substrate; creating amask for said feature pattern that reduces a density of defects thatoccur due to at least one of tolerance variations and a malfunctioningnozzle of the microdeposition head; and depositing said droplets offluid material onto said substrate based on said mask to definesub-features of said feature pattern.
 2. The method of claim 1 furthercomprising assigning one of said nozzles of said microdeposition head toeach of said sub-features in said feature pattern.
 3. The method ofclaim 2 further comprising associating said assigned nozzles in saidmask with one of a plurality of passes of said microdeposition head. 4.The method of claim 2 wherein said step of assigning includesrandomizing an assigned nozzle for said sub-features.
 5. The method ofclaim 1 wherein said microdeposition pass is performed by at least oneof moving said microdeposition head in a linear direction relative tosaid substrate and moving said substrate in a linear direction relativeto said microdeposition head.
 6. The method of claim 1 wherein at leastone of said sub-features is formed by multiple droplets that aremicrodeposited in layers, and wherein said mask assigns a differentnozzle to each of said layers of said multiple-layer sub-feature.
 7. Themethod of claim 1 wherein said feature pattern defines a component of anelectrical device.
 8. The method of claim 8 wherein said electricaldevice is one of a polymer light emitting diode, an integrated circuitpackage, a light panel, and a printed circuit board.
 9. The method ofclaim 1 wherein said droplets form at least one of a light emitter, anelectrical conductor, an electrical trace, an insulator, a solder bump,bondwire, plating, interconnects, a capacitor and a resistor.
 10. Themethod of claim 1 wherein said mask increases a number ofmicrodeposition passes and reduces firing of nozzles of saidmicrodeposition head during each of said microdeposition passes.
 11. Amicrodeposition system for microdepositing precise amounts of fluidmaterial onto a substrate, comprising: a microdeposition head thatincludes a plurality of spaced nozzles; a positioning device thatcontrols a position of said microdeposition head relative to saidsubstrate; and a controller including a mask generating module thatcreates a mask for said feature pattern that reduces a density ofdefects that occur due to at least one of tolerance variations and amalfunctioning nozzle of said microdeposition head, a positioning modulethat communicates with said positioning device and that generatesposition control signals for said positioning device based on said mask,and a nozzle firing module that communicates with said microdepositionhead and that selectively generates nozzle firing commands to firedroplets of fluid material onto said substrate based on said mask todefine sub-features of said feature pattern.
 12. The microdepositionsystem of claim 11 wherein said mask generating module assigns one ofsaid nozzles of said microdeposition head to each of said sub-featuresin said feature pattern.
 13. The microdeposition system of claim 12wherein said mask generating module associates said assigned nozzles insaid mask with one of a plurality of passes of said microdepositionhead.
 14. The microdeposition system of claim 12 wherein said maskgenerating module randomizes nozzles assigned to said sub-features. 15.The microdeposition system of claim 11 wherein a microdeposition pass isperformed by at least one of moving said microdeposition head in alinear direction relative to said substrate and moving said substrate ina linear direction relative to said microdeposition head.
 16. Themicrodeposition system of claim 11 wherein at least one of saidsub-features is formed by multiple droplets that are microdeposited inlayers, and wherein said mask assigns a different nozzle to each of saidlayers of said multiple-layer sub-feature.
 17. The microdepositionsystem of claim 11 wherein said feature pattern defines a component ofan electrical device.
 18. The microdeposition system of claim 18 whereinsaid electrical device is one of a polymer light emitting diode, a lightpanel, an integrated circuit package and a printed circuit board. 19.The microdeposition system of claim 11 wherein said droplets form atleast one of a light emitter, an electrical conductor, an electricaltrace, an insulator, a solder bump, bondwire, plating, interconnects, acapacitor and a resistor.
 20. The microdeposition system of claim 11wherein said mask increases a number of microdeposition passes andreduces firing of nozzles of said microdeposition head during each ofsaid microdeposition passes.
 21. A method for microdepositing dropletsof fluid material to define pixels of a polymer light emitting display(PLED) using a microdeposition system, comprising: defining locations ofsaid pixels of said PLED on a substrate; creating a mask for said pixelsthat reduces a density of defects that occur due to at least one oftolerance variations and a malfunctioning nozzle of the microdepositionhead; and depositing said droplets of fluid material onto said substratebased on said mask to define said pixels.
 22. The method of claim 21further comprising assigning one of said nozzles of said microdepositionhead to microdeposition each pixel component of said pixels, whereineach of said pixel components is defined by a plurality of droplets. 23.The method of claim 22 further comprising associating said assignednozzles in said mask with one of a plurality of passes of saidmicrodeposition head.
 24. The method of claim 22 wherein said step ofassigning includes randomizing an assigned nozzle for said pixelcomponents.
 25. The method of claim 21 wherein said microdeposition passis performed by at least one of moving said microdeposition head in alinear direction relative to said substrate and moving said substrate ina linear direction relative to said microdeposition head.
 26. The methodof claim 21 wherein said mask increases a number of microdepositionpasses and reduces firing of nozzles of said microdeposition head duringeach of said microdeposition passes.
 27. The method of claim 21 whereinsaid PLED is a color PLED and wherein said pixels include first, secondand third pixel components having different colors.
 28. The method ofclaim 21 wherein said PLED is a monochrome PLED.
 29. A microdepositionsystem that microdeposits droplets of fluid material to define pixels ofa polymer light emitting display (PLED), comprising: a microdepositionhead that includes a plurality of spaced nozzles; a positioning devicethat controls a position of said microdeposition head relative to saidsubstrate; and a controller including a mask generating module thatcreates a mask that reduces a density of defects that occur due to atleast one of tolerance variations and a malfunctioning nozzle of saidmicrodeposition head, a positioning module that communicates with saidpositioning device and that generates position control signals for saidpositioning device based on said mask, and a nozzle firing module thatcommunicates with said microdeposition head and that selectivelygenerates nozzle firing commands to fire droplets of fluid material ontosaid substrate based on said mask to define said pixels.
 30. Themicrodeposition system of claim 29 wherein said mask generating moduleassigns one of said nozzles of said microdeposition head to each pixelcomponent of said pixels, and wherein each of said pixel components isformed by multiple droplets.
 31. The microdeposition system of claim 29wherein said mask generating module associates said assigned nozzles insaid mask with one of a plurality of passes of said microdepositionhead.
 32. The microdeposition system of claim 29 wherein said maskgenerating module randomizes nozzles assigned to said pixel componentsof said pixels.
 33. The microdeposition system of claim 31 wherein amicrodeposition pass is performed by at least one of moving saidmicrodeposition head in a linear direction relative to said substrateand moving said substrate in a linear direction relative to saidmicrodeposition head.
 34. The microdeposition system of claim 29 whereinsaid PLED is a color PLED and wherein said pixels include first, secondand third pixel components having different colors.
 35. Themicrodeposition system of claim 29 wherein said PLED is a monochromePLED.